Beilstein J. Nanotechnol.2020,11, 1693–1703, doi:10.3762/bjnano.11.151
irradiation-induced mechanical strain in the patterning process are elaborated and discussed.
Keywords: direct patterning; focused helium ion beam; out-of-planenanopatterning; polymers; thin films; Introduction
Micro- and nanofabrication with focused ion beams (FIBs) is currently a subject of strong
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Figure 1:
(a) AFM image and (b) the corresponding depth profile of a fragment of the surface depression produ...